Method of producing thin sheets and use of such sheets for the p

X-ray or gamma ray systems or devices – Specific application – Lithography

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430 5, 430966, G21K 500

Patent

active

050349724

ABSTRACT:
A method of producing thin sheets that are stretched over a frame and have planar and smooth surfaces with a low density of defects, and to the use of such sheets for the production of X-ray masks, wherein the sheet material is applied to a substrate through the intermediary of a release layer, whereupon the sheet is connected with the frame and separated from the substrate. During application of the release layer to the substrate, an area along the entire edge of the substrate is left free of the release layer material but is convered by the subsequently applied sheet material. Thereafter the sheet is connected with the frame in a region overlying the release layer and is severed around the periphery of the frame. Finally, the sheet and frame are released from the substrate and any release layer material remaining on the sheet is removed. The resulting sheet and frame arrangement may then be used to form an X-ray mask by applying desired X-ray absorber structures to the surface of the sheet. Alternatively the X-ray absorber structures may be formed on the surface of the sheet prior to attachment of the frame.

REFERENCES:
patent: 4539278 (1983-09-01), Williams et al.
patent: 4677042 (1987-06-01), Kato et al.
patent: 4701391 (1987-10-01), Lentfer et al.
patent: 4837123 (1989-06-01), Kato et al.
Solid State Technology (SSTEAP 27 (9)), Sep. 1984, p. 194, "Advances in X-Ray mask Technology", A. R. Shimkunas.
Journal of the Electrochemical Society, vol. 128, No. 5, May 1981, pp. 1117-1118, "X-Ray Lithography Mask Technology", W. D. Buckley, J. F. Nesler & H. Windischmann.

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