Method of producing thin-film storage disk

Details Method of producing thin-film storage disk Method of producing thin-film storage disk

1985-12-27

1989-03-28

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, C23C 1434

Patent

active

048161276

ABSTRACT:
A method of producing a thin-film magnetic disk having high coercivity and magnetic remanence, good loop squareness, and low fluctuation in peak-to-peak recording signal amplitude over an entire circular recording path. The novel aspects of the method which contribute to the performance characteristics of the disk are (a) layering a 300-1,000 .ANG. magnetic film containing between about 70-88% cobalt, 10-28% nickel, and 2-12% chromium over a 1,000-4,000 .ANG. chromium underlayer; (b) forming the film and underlayer under sputtering disposition conditions which prevent low-angle asymmetrical sputtering; and (c) shielding the disk substrate during sputtering in a manner which produces substantially uniform-thickness deposition.

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Ahn, K. Y. et al., IBM Technical Disclosure 21(10) 4232 (1979).
Simpson, E. M. et al., IEEE, B-P-28:148 (1984).

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