Method of producing thin film multi-layered substrate

Details Method of producing thin film multi-layered substrate Method of producing thin film multi-layered substrate

1993-08-03

1995-06-06

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430327, 205220, G03C 500

Patent

active

054222281

ABSTRACT:
A method of producing a thin film multi-layered substrate involving the steps of subjecting a copper wiring formed on a substrate to chromate treatment with an aqueous solution containing potassium bichromate or sodium bichromate as a principal component and containing chromic anhydride blended therewith, forming an interlevel insulating film consisting of photosensitive polyimide on the copper wiring, and exposing and developing the photosensitive polyimide film to form a pattern. A miniature pattern can be formed at a high speed and with high production yield.

REFERENCES:
patent: 4952285 (1990-08-01), Lin
patent: 5175399 (1992-12-01), Mori
English language Abstracts for JP 03-005907.
English language Abstract for JP 04-051518.

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