Method of producing recording media and its apparatus

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

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20419216, 20419215, 20429825, 20429835, 156345, C23C 1434

Patent

active

052445542

ABSTRACT:
A method of producing recording media which comprises steps of arranging substrates for recording media on a carrier which is purified by etching with a plasma state gas; and forming a plurality of sputtered layers on the substrates.
An apparatus for producing recording media which comprises a sputtering chamber which forms a recording layer; and a treatment chamber which precedes the sputtering chamber, and in which a carrier to be arranged with substrates for the recording media is purified by a plasma state gas.

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