Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1991-06-18
1993-09-14
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419215, 20429825, 20429835, 156345, C23C 1434
Patent
active
052445542
ABSTRACT:
A method of producing recording media which comprises steps of arranging substrates for recording media on a carrier which is purified by etching with a plasma state gas; and forming a plurality of sputtered layers on the substrates.
An apparatus for producing recording media which comprises a sputtering chamber which forms a recording layer; and a treatment chamber which precedes the sputtering chamber, and in which a carrier to be arranged with substrates for the recording media is purified by a plasma state gas.
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Hirai Shuichi
Yamagata Noriaki
Yoshino Nobuyuki
Denki Kagaku Kogyo Kabushiki Kaisha
Nguyen Nam X.
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