Method of producing photoresist

Details Method of producing photoresist Method of producing photoresist

2007-09-04

2007-09-04

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

Reexamination Certificate

active

10117248

ABSTRACT:
Provided are a method of producing a photoresist comprising a process of filtrating a raw resist solution containing resist constituent components and a resist solvent dissolving them, using a filter made of at least one resin selected from fluorine-based resins and polyolefins, wherein this filter has been used for filtration of the same or different kind of other raw resist solution and has been washed with a solvent containing the resist solvent toward the reverse direction to the filtration direction, and a method of sequentially producing two or more photoresists using the same production apparatus, wherein this production apparatus is washed with the resist solvent, a solvent other than this resist solvent capable of dissolving or decomposing the resist constituent components, and the resist solvent, in this order, after production of the photoresist and before production of the subsequent photoresist.

REFERENCES:
patent: 2886178 (1959-05-01), Davis et al.
patent: 3613888 (1971-10-01), Harris
patent: 3704573 (1972-12-01), Koller et al.
patent: 4482461 (1984-11-01), Hindman et al.
patent: 5368987 (1994-11-01), Hanamoto et al.
patent: 5464687 (1995-11-01), Sheth
patent: 5556522 (1996-09-01), Ingalls et al.
patent: 5667683 (1997-09-01), Benian
patent: 6342163 (2002-01-01), DeLonge et al.
patent: 6436720 (2002-08-01), Oberbeck et al.
patent: 0 625 568 (1994-11-01), None
patent: 7 118 693 (1995-05-01), None
Internet document which shows that CLEARSEP TM cartridge filters used in Hanamoto's Example 1 is made od polypropylene, obtained by the Examiner on the internet.

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