Method of producing microscopic structure

Details Method of producing microscopic structure Method of producing microscopic structure

1993-03-19

1994-09-27

Dang, Thi

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

156651, 1566611, 156643, B44C 100

Patent

active

053504992

ABSTRACT:
A method of producing a microscopic structure by anisotropic etching, in which ion etcing is conducted by irradiating an ion beam emitted by an ion source over a workpiece while a direction of progress of the ion etching is being changed.

REFERENCES:
patent: 4869780 (1989-09-01), Yang et al.
patent: 4935334 (1990-06-01), Boettiger et al.
patent: 4988404 (1991-01-01), Aoyagi
patent: 5032243 (1991-07-01), Bache et al.
patent: 5035770 (1991-07-01), Braun
Patent Abstracts of Japan, vol. 6, No. 16 (E-92) Jan. 29, 1982.
Patent Abstracts of Japan, vol. 14, No. 139 (E-903) Mar. 15, 1990.

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