Method of producing fluoride-sensitive diaphragms

Details Method of producing fluoride-sensitive diaphragms Method of producing fluoride-sensitive diaphragms

1985-08-07

1987-10-13

Childs, Sadie L.

Coating processes

Electrical product produced

Metallic compound coating

2041921, 20419215, 4272481, 427255, B05D 512

Patent

active

046998063

ABSTRACT:
A method of manufacturing diaphragms which are sensitive to fluoride ions, by depositing a poly-crystalline thin layer of difficulty soluble fluoride of 20 nm to 5,000 nm thick by means of sputtering or vaporization onto a substrate at temperatures of above 280.degree. C.

REFERENCES:
patent: 3034924 (1962-05-01), Kraus et al.
patent: 3147132 (1964-09-01), Geffcken
patent: 4112157 (1978-09-01), Krueger et al.
patent: 4146309 (1979-03-01), Singh et al.
Phahle et al, "Dielectric Properties of R.F. Sputtered Thin Aluminium Fluoride Films", Thin Solid Films, vol. 38, pp. 73-81, 1976.
MacDonald and Toth, The Development of Fluoride-Sensitive Membrane Electrodes, Part I., 1967, pp. 99-106.
Fjeldy and Nagy, Fluoride Electrodes with Reversible Solid-State Contacts, 1979, pp. 1299-1303.
Van Der Spiegel, Lauks, Chan, and Babic, The Extended Gate Chemically Sensitive Field Effect Transistor as Multi-Species Microprobe, 1983, pp. 291-298.

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