Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-04-01
1999-03-16
Lewis, Michael
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
423446, C01B 3106
Patent
active
058827404
ABSTRACT:
A method is provided for efficiently producing an entirely quality-controlled CVD diamond. A CVD process is interrupted at an early stage and the deposit is taken out of the reaction chamber, before a significant mass is accumulated, and is inspected by means of cathodoluminescence. The spectrum are compared with a given reference in terms of peak position, half width and 20%-value width in coordination. The observed deviation allows to determine whether to maintain or alter the settings.
A diamond substance of acceptable quality which is properly specified in terms of the CL parameters is also provided.
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Yokota et al, "Effect of Doping With Nitrogen and Boron on Cathodo-Luminescene of CUD Diamond", Mot. Res. Symp. Proc. vol. 162 pp. 231-236 1990 No Month.
Chen Chia-Fu
Hosomi Satoru
Ishizuka Hiroshi
Ko Ensei
Nishimura Kazuhito
Hendrickson Stuart L.
Ishizuka Research Institute Ltd.
Ko Ensei
Lewis Michael
Osaka Diamond Industrial Co., Ltd
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