Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1991-11-06
1996-04-23
Lewis, Michael
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427249, 117 86, 423446, C01B 3106
Patent
active
055101577
ABSTRACT:
Making a diamond substance exhibiting a cathodoluminescence spectrum with the peak at a photon energy greater than 2.8 eV (electron volt), the half-value and 20%-value width not exceeding 0.5 eV and 0.8 eV, respectively, comprising: providing a substrate in a closed chamber, introducing a matrix gas comprising H.sub.2 and one selected from hydrocarbon and CO to said chamber, exciting the gas to create a plasma while heating said substrate to a temperature of at least 700.degree. C. and, thus, causing deposition and growth of diamond substance which is crystallographically diamond, controlling parameters of the deposition by means of the cathodoluminescence record and recovering the diamond substance from the chamber.
REFERENCES:
patent: 4767608 (1988-08-01), Matsumoto et al.
patent: 4932331 (1990-06-01), Kurihara et al.
patent: 4985227 (1991-01-01), Ito et al.
Field, J. E. (Ed), The Properties of Diamond, Part I, Chapter 5, "Cathodoluminescence", pp. 165-181, Academic Press, New York (1979) (no month).
Chen Chia-Fu
Hosomi Satoru
Ishizuka Hiroshi
Ko Ensei
Nishimura Kazuhito
Hendrickson Stuart L.
Ishizuka Research Institute Ltd.
Ko Ensei
Lewis Michael
Osaka Diamond Industrial Co., Ltd.
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