Method of producing an optical information recording medium

Details Method of producing an optical information recording medium Method of producing an optical information recording medium

1986-07-21

1987-05-05

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, C23C 1440

Patent

active

046630082

ABSTRACT:
An optical information recording medium is produced by introducing a plasma-generation gas comprising hydrocarbon into a plasma-generating region provided with a metal target and a substrate. The pressure of the plasma-generating gas is maintained within a predetermined range within the plasma-generating region. Electrical power is applied to the plasma-generating gas to dissociate the gas thereby forming a plasma. The generated plasma sputters the metal target, thereby allowing the sputtered metal to be deposited on the substrate in the form of a film containing the metal and the carbon liberated from the hydrocarbon. During sputtering, the product between the density of the power applied to the electrode and the average residence time of the plasma-generating gas within the plasma-generating region is controlled within such that the product falls within the range of more than 0.5 W-sec/cm.sup.2 and less than 50 W-sec/cm.sup.2, and the partial pressure of a secondary hydrocarbon, which is different from the introduced hydrocarbon, present during the dissociation to the secondary hydrocarbon before the dissociation and after the introduction is set to range between 2 and 12.

REFERENCES:
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patent: 4414085 (1983-11-01), Wickersham
J. Appl. Polym. Sci., vol. 17, (1973), H. Kobayashi, A. T. Bell, and M. Shen, p. 887.
Thin Solid Films, vol. 107, No. 1, Sep. 1983, Lausanne, CH; J. A. Thornton, "Plasma-Assisted Deposition Processes: Theory Mechanisms and Applications", pp. 3-19.
Thin Solid Films, vol. 97, No. 4, Nov. 1982, Lausanne, CH; S. Craig et al., "Structure, Optical Properties and Decomposition Kinetics of Sputtered Hydrogenated Carbon", pp. 345-361.
Thin Solid Films, vol. 107, No. 1, Sep. 1983; Lausanne, CH; R. F. Bunshah, "Processes of the Activated Reactive Evaporation Type and Their Tribological Applications".

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