Method of producing an etched base plate for an ink print head

Details Method of producing an etched base plate for an ink print head Method of producing an etched base plate for an ink print head

1989-05-01

1991-07-02

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430321, 430323, G03F 700

Patent

active

050285149

ABSTRACT:
A method for making an etched base plate for an ink printer head includes the steps of disposing on each face of a base plate a mask having a pattern, exposing the base plate simultaneously through the masks to light of a wavelength to which the base plate is photosenstive, heating the base plate to a temperature at which the amorphous glass structure in the exposed regions is converted to a ceramic crystalline structure and dipping the base plate into an etching agent solution to remove the crystalline structure from the base plate to thus provide in each plate face ink printing chambers, ink channels and at least one row of nozzle discharge openings in the shape of the exposed regions. The patterns formed on the masks are mirror images of each other.

REFERENCES:
patent: 4096626 (1978-06-01), Olsen et al.
patent: 4216483 (1980-08-01), Kyser et al.
patent: 4390391 (1983-06-01), Fujita et al.

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