Method of producing a thin film by sputtering and an opposed tar

Details Method of producing a thin film by sputtering and an opposed tar Method of producing a thin film by sputtering and an opposed tar

1987-12-22

1988-11-15

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20419214, 204298, C23C 1500

Patent

active

047847395

ABSTRACT:
A method and apparatus for producing a thin film, such as a magnetic thin film and a metallic thin film on a substrate, such as plastic film, by the employment of a pair of opposed targets spaced apart from one another in a vacuum sputtering gas atmosphere, and magnetic field generating units for generating the perpendicular magnetic field extending perpendicularly to the surface of the targets for confining plasma in the space, and a reflecting electrode arranged adjacent to and in front of the magnetic field generating units and around the periphery of the targets for reflecting electrons toward the space between the opposed targets. The magnetic field generating units are arranged around the outer periphery of each of the opposed targets, and are capable of generating an auxiliary magnetic field for capturing the electrons. The combination of the reflecting of the electrons and the auxiliary magnetic field promotes a uniform erosion of the entire surfaces of the targets and enables a control of the thickness of the deposited film on a substrate having a large width.

REFERENCES:
patent: 4395323 (1983-07-01), Denton et al.
patent: 4407894 (1983-10-01), Kadokura et al.
patent: 4576700 (1986-03-01), Kadokura et al.
T. A. Amundsen et al., IBM Tech. Disc. Bull; vol. 12, p. 1809 (1970).
M. Naoe et al., J. Crystal Growth, vol. 45, pp. 361-364 (1978).
S. Kadokura et al., IEEE Trans. Magnetics, MAG 17, pp. 3175-3177 (1981).
M. Naoe et al., J. Appl. Phys., vol. 53, pp. 2748-2750 (1982).

Affiliated with

Also associated with

Rating

Method of producing a thin film by sputtering and an opposed tar does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing a thin film by sputtering and an opposed tar, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a thin film by sputtering and an opposed tar will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1102157