Method of producing a substrate with a surface treated by a...

Details Method of producing a substrate with a surface treated by a... Method of producing a substrate with a surface treated by a...

2006-11-21

2006-11-21

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C204S192100, C118S7230ER, C257SE21347

Reexamination Certificate

active

07138343

ABSTRACT:
In order to produce substrate surfaces with a given two-dimensional surface distribution arising from a treatment using a vacuum treatment process, an inhomogeneous plasma (5) with a density distribution is generated and moved relative to the substrate (9) with a given movement.

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