Method of producing a semiconductor integrated circuit...

Details Method of producing a semiconductor integrated circuit... Method of producing a semiconductor integrated circuit...

2005-02-01

2005-02-01

Quach, T. N. (Department: 2814)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S296000, C257S382000, C257S760000

Reexamination Certificate

active

06849885

ABSTRACT:
An amount of a semiconductor substrate cut due to etching in the bottom of a contact hole formed by the SAC technique is reduced. Silicon oxide films are dry etched under the conditions of increasing the etching selective ratio of the silicon oxide films to an insulating film. Then, the conditions are changed to those increasing the etching selective ratio of the insulating film to the silicon oxide films and the insulating film is etched by a predetermined amount.

REFERENCES:
patent: 5817562 (1998-10-01), Chang et al.
patent: 5942803 (1999-08-01), Shim et al.
patent: 6037211 (2000-03-01), Jeng et al.
patent: 6037228 (2000-03-01), Hsu
patent: 6136716 (2000-10-01), Tu
patent: 6228731 (2001-05-01), Liaw et al.
patent: 6300238 (2001-10-01), Lee et al.
patent: 6335279 (2002-01-01), Jung et al.
patent: 6501140 (2002-12-01), Honeycutt et al.
patent: 6531350 (2003-03-01), Satoh et al.
patent: 6555861 (2003-04-01), Yamada et al.
patent: 6649500 (2003-11-01), Koga
patent: 6727539 (2004-04-01), Divakaruni et al.
patent: 6753219 (2004-06-01), Sekiguchi et al.
patent: 6777279 (2004-08-01), Hashimoto et al.
patent: 5-47720 (1993-02-01), None
patent: 9-330976 (1997-12-01), None
patent: 11-68064 (1999-03-01), None
patent: 11-135781 (1999-05-01), None

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