Method of producing a semiconductor element in a substrate

Details Method of producing a semiconductor element in a substrate Method of producing a semiconductor element in a substrate

2007-05-14

2010-11-16

Monbleau, Davienne (Department: 2893)

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

C257SE21400

Reexamination Certificate

active

07833886

ABSTRACT:
A method of producing a semiconductor element in a substrate includes forming a plurality of micro-cavities in a substrate, creating an amorphization of the substrate to form crystallographic defects and a doping of the substrate with doping atoms, depositing an amorphous layer on top of the substrate, and annealing the substrate, such that at least a part of the crystallographic defects is eliminated using the micro-cavities. The semiconductor element is formed using the doping atoms.

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