Method of producing a porous dielectric element and...

Details Method of producing a porous dielectric element and... Method of producing a porous dielectric element and...

2007-12-03

2010-06-08

Smith, Zandra (Department: 2822)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S623000

Reexamination Certificate

active

07732348

ABSTRACT:
A porous dielectric element is produced by forming a first dielectric and a second dielectric. The second dielectric is dispersed in the first dielectric. The second dielectric is then removed from the second dielectric by using a chemical dissolution. The removal of the second dielectric from the first dielectric leaves pores in the first dielectric. The pores, which are filled with air, improves the overall dielectric constant of the resulting dielectric element.

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