Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-03-03
1993-08-31
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 20419223, C23C 1434
Patent
active
052405818
ABSTRACT:
Disclosed herein is a method of producing a magnetooptical disk by way of depositing a recording layer, a protective layer, and a reflection layer on a transparent substrate. The inventive method features that the refractive index of the protective layer is subjected to a precise control by way of changing the flow rate of argon gas within the range of no greater than 100 SCCM while maintaining the flow rate of nitrogen gas substantially constant at a value within the range of 3 to 10 SCCM.
REFERENCES:
patent: 4948482 (1990-08-01), Kobayashi et al.
patent: 4959136 (1990-09-01), Hatwar
Dodd Thomas J.
Hall James D.
SKC Limited
Weisstuch Aaron
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