Method of producing a cover layer of amorphous carbon on a subst

Details Method of producing a cover layer of amorphous carbon on a subst Method of producing a cover layer of amorphous carbon on a subst

1989-06-26

1992-06-16

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20419222, 20419226, C23C 1406, C23C 1438

Patent

active

051222493

ABSTRACT:
A method of providing an amorphous carbon cover layer on an electrophotographic recording material, including the steps of (a) providing a substrate which is an electrophotographic recording material, (b) maintaining the substrate in an atmosphere comprised of argon, hydrogen, and C.sub.2 F.sub.6, and (c) simultaneously with step (b), depositing amorphous fluorinated, hydrogenated carbon on the substrate by direct current magnetron cathode sputtering of glasslike carbon to provide an amorphous carbon cover layer which is transparent, hydrophobic, and has a Vickers hardness of greater than 2000.

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patent: 4877677 (1989-10-01), Hirochi
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S. Yamada, A Review of Glasslike Carbons, Defense Ceramic Information Center, Battelle Memorial Institute, Columbus, OH, Apr., 1968, pp. 1-2.
L. H. Edelson et al, Method for Removing Surface Porosity on Glassy Carbon Tiles, Carbon, vol. 24, pp. 635.
Stuart, Vacuum Technology, Thin Films and Sputtering, Academic Press, New York, 1983, pp. 123-131.
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John L. Vossen et al, Thin Film Processes, Academic Press, 1978, pp. 46-50, 526-527.

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