Method of producing a colorating coating

Details Method of producing a colorating coating Method of producing a colorating coating

1996-11-29

1999-05-04

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427578, 427249, 4272552, 427162, 427166, 427167, C23C 1632

Patent

active

059002891

ABSTRACT:
A method of producing a thin coating by plasma-assisted chemical vapor phase deposition from a carbonaceous and metalliferous gas phase of a predetermined composition on a substrate surface especially in the form of a diamond-like carbon-silicon-hydrogen compound, wherein for the coloration the optical thickness of the coating or of one layer region or of a plurality of layer regions of the coating each, is predetermined in one single vacuum coating process in that due to interferences of the first order and/or of a higher order the desired color impression results at the coating or at its layer region(s) according to the principle of interference at thin films, and in the portion of the coating adjacent to the substrate surface first of all a non-colorating layer region, providing hardness and wear resistance of the complete coating, is produced with a larger thickness in relation to the colorating region or regions, wherein preferably shortly before achieving the total thickness of the coating the composition of the layer-forming gas phase is continuously or stepwise changed in that, in addition to the colorating layer regions to be deposited thereon, at least one gradient of the layer composition and of the refractive index is formed causing an optical reflection boundary surface.

REFERENCES:
patent: 4170460 (1979-10-01), Donley
patent: 4545646 (1985-10-01), Chern et al.
patent: 5198285 (1993-03-01), Arai et al.
patent: 5462775 (1995-10-01), Yamada et al.
patent: 5580364 (1996-12-01), Goodman et al.

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