Method of producing a calibration wafer

Details Method of producing a calibration wafer Method of producing a calibration wafer

2007-01-30

2007-01-30

Sarkar, Asok Kumar (Department: 2891)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C374S001000, C374S121000, C374S126000, C374S179000, C257SE21530

Reexamination Certificate

active

10536788

ABSTRACT:
A method of producing a calibration wafer having at least a predetermined emissivity, including providing a wafer of semiconductor material; subjecting the bulk material of the wafer to doping with foreign atoms and/or generating lattice defects to obtain the predetermined emissivity; and coating the wafer to obtain a further optical characteristic.

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