Method of processing thin metal sheets by photoetching

Details Method of processing thin metal sheets by photoetching Method of processing thin metal sheets by photoetching

1987-04-06

1988-07-05

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156634, 156640, 156644, 156656, 1566591, 1566611, 156233, 156247, 430 23, 430312, 430318, C23F 102, B44C 122

Patent

active

047552573

ABSTRACT:
A photoetching method for processing a thin metal sheet to produce apertured shadow masks. The disclosed method utilizes a supporting layer for supporting a metal sheet. A photoresist layer is formed on the metal sheet for defining pattern images. An etching solution is supplied to metal sheet surfaces exposed through voids of the photoresist layer defining the pattern images to etch the metal surfaces. Then the photoresist layer is removed from the metal sheet, and the metal sheet is removed from the supporting sheet. The resulting metal sheet constitutes a shadow mask having a multiplicity of apertures. Productivity may be doubled by applying two metal sheets to opposite faces of the supporting sheet, respectively, and processing both metal sheets simultaneously.

REFERENCES:
patent: 3506507 (1970-04-01), Brietzke
patent: 3960561 (1976-06-01), Haining et al.
patent: 4155801 (1979-05-01), Provancher
patent: 4341591 (1982-07-01), Tamutus

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