Method of processing materials using an inductively coupled plas

Details Method of processing materials using an inductively coupled plas Method of processing materials using an inductively coupled plas

1988-12-23

1990-01-30

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 21912137, 21912148, 21912152, 21912159, H01J 724, B23K 900

Patent

active

048975796

ABSTRACT:
A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.

REFERENCES:
patent: 4431901 (1984-02-01), Hull
patent: 4795879 (1989-01-01), Hull et al.
patent: 4812166 (1989-03-01), Saiki et al.

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