Method of processing an article in a supercritical atmosphere

Details Method of processing an article in a supercritical atmosphere Method of processing an article in a supercritical atmosphere

1989-02-28

1990-07-31

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 31, 134105, 156656, 1566591, 156345, 156668, 430318, 430323, 430329, B44C 122, C23F 102, B29C 3700, C03C 1500

Patent

active

049448374

ABSTRACT:
In a method of processing an article, the article is introduced into a supercritical atmosphere which is formed in a pressure vessel and which atmosphere comprises carbon dioxide. When the article comprises an exposed resist film on a surface layer formed on a substrate, the exposed resist film is selectively removed to leave a predetermined pattern in the supercritical atmosphere and is thus processed into a patterned resist film. After the surface layer is selectively etched through the patterned resist film to form a patterned surface layer, the patterned resist film may be introduced into the supercritical atmosphere to be completely removed from the patterned surface layer. On processing the article, such as a compact disc, a mechanical parts, or the like, the article may be also introduced into the supercritical atmosphere to be cleaned up.

REFERENCES:
patent: 4341592 (1982-07-01), Shortes et al.

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