Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-06-15
1995-09-05
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419234, 2504921, 216 59, 216 62, 216 66, C23C 1446, B23K 1500
Patent
active
054476143
ABSTRACT:
A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.
REFERENCES:
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patent: 4936968 (1990-06-01), Ohnishi et al.
patent: 4976843 (1990-12-01), Ward et al.
patent: 5223109 (1993-06-01), Itoh et al.
Azuma Junzou
Hamamura Yuuichi
Haraichi Satoshi
Itoh Fumikazu
Koizumi Yasuhiro
Breneman R. Bruce
Hitachi , Ltd.
McDonald Rodney G.
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