Method of process control

Details Method of process control Method of process control

2007-04-03

2007-04-03

Paladini, Albert W. (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S110000, C700S121000, C702S084000, C438S007000, C382S145000

Reexamination Certificate

active

11214115

ABSTRACT:
The present invention relates to a method of run-to-run control of a manufacturing process. A plurality of runs of the manufacturing process is performed. In each of the runs, a value of a process input is applied to the manufacturing process. A measured value of a process output of the respective run is determined. A process input quantity is calculated based on the measured value, the applied process input, a target value of the process output and at least one value of a sensitivity parameter. The sensitivity parameter describes a variation of the process output caused by a variation of the process input. The process input applied in a subsequent one of the plurality of runs is based on the process input quantity. The sensitivity parameter is modified between at least one pair of the runs of the manufacturing process. The method of run-to-run control may be applied in order to control a critical dimension of regions of a photoresist layer remaining on a surface of a semiconductor structure after development of the photoresist layer.

REFERENCES:
patent: 5526293 (1996-06-01), Mozumder et al.
patent: 5926690 (1999-07-01), Toprac et al.
patent: 5976740 (1999-11-01), Ausschnitt et al.
patent: 6625512 (2003-09-01), Goodwin
patent: 2002/0191165 (2002-12-01), Baselmans et al.
patent: 2003/0058428 (2003-03-01), Jun et al.

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