Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Removal of imaged layers
Reexamination Certificate
2005-08-16
2005-08-16
Duda, Kathleen (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Removal of imaged layers
C430S313000, C134S001100
Reexamination Certificate
active
06929902
ABSTRACT:
A method of preventing repeated collapse in a reworked photoresist layer. First, oxygen-containing plasma is applied to remove a collapsed photoresist. Because the plasma containing oxygen reacts with a bottom anti-reflect layer comprising SiOxNy, some acids are produced on the bottom anti-reflect layer, resulting in undercutting in a subsequently reworked photoresist. Next, an alkaline solution treatment is performed on the anti-reflect layer after the collapsed photoresist layer is removed. Finally, the reworked photoresist with is formed on the anti-reflect layer, without undercutting.
REFERENCES:
patent: 6218085 (2001-04-01), Molloy et al.
patent: 2002/0123161 (2002-09-01), Ushiki et al.
patent: 2003/0087518 (2003-05-01), Chen et al.
Chen Yi-Nan
Huang Teng-Yen
Wu Wen-Bin
Wu Yuan-Hsun
Duda Kathleen
Nanya Technology Corporation
Quintero Law Office
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