Method of preventing photoresist residue on metal lines

Details Method of preventing photoresist residue on metal lines Method of preventing photoresist residue on metal lines

1997-10-17

1999-08-17

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430323, 430329, 430330, 438694, 438710, G03F 742, H01L 21306

Patent

active

059392410

ABSTRACT:
A method of preventing photoresist residue on metal lines is disclosed herein. A strip recipe with a preheat step has been developed for use with the Applied Materials Mxp Centura. The preheat step is performed before the strip step. The preheat step can rapidly shorten the temperature balance time between the wafer and the strip chamber and make the photoresist flow to increase photoresist surface area. Therefore, the strip photoresist rate will be improved by higher wafer temperature in the first few strip cycles.

REFERENCES:
patent: 4845053 (1989-07-01), Zajac
patent: 5792672 (1998-08-01), Chan et al.

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