Method of preventing pattern collapse during rinsing and drying

Details Method of preventing pattern collapse during rinsing and drying Method of preventing pattern collapse during rinsing and drying

2011-06-28

2011-06-28

Cleveland, Michael (Department: 1712)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S021000, C134S030000, C134S095200, C134S099100, C134S902000

Reexamination Certificate

active

07967916

ABSTRACT:
A system and method for preventing a pattern formed on a substrate from collapsing during a rinsing and drying phase of a fabrication operation includes determining a plurality of process parameters associated with a rinsing chemistry used during the rinsing operation. The process parameters define the characteristics of the rinsing chemistry and a substrate surface layer. A chemistry to reduce the surface tension of the rinsing chemistry (surface tension reducer) with at least one low surfactant chemical is identified based on the process parameters of the rinsing chemistry. The surface tension reducer is applied to the surface of the substrate such that the low surfactant chemical reduces the surface tension of the rinsing chemistry applied to the surface of the substrate thereby preventing the pattern from collapsing.

REFERENCES:
patent: 6660459 (2003-12-01), Babcock
patent: 2003/0075204 (2003-04-01), de Larios et al.
patent: 2004/0069319 (2004-04-01), Boyd et al.
patent: 2005/0250054 (2005-11-01), Chang
patent: 2008/0314422 (2008-12-01), O'Donnell et al.
patent: 2003178943 (2003-06-01), None
English Machine Translation of JP 2003-178943. Jun. 27, 2003. pp. 1-19.

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