Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-10-03
1990-01-09
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, 427129, C23C 1434
Patent
active
048926345
ABSTRACT:
A method of making a thermo-magneto-optic element stable over wide temperature ranges wherein a barrier layer is applied to a polymeric substrate, the substrate is first exposed to an RF oxygen plasma treatment at a power of from about 50 to about 200 watts and a time of from about 5 to about 200 seconds.
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patent: 4719154 (1988-01-01), Hatwar
patent: 4735698 (1988-04-01), Nomura et al.
patent: 4737408 (1988-04-01), Kuwahara et al.
patent: 4761334 (1988-08-01), Sagoi et al.
patent: 4762742 (1988-08-01), Sonoda et al.
patent: 4786559 (1988-11-01), Murakami et al.
Glocker David A.
Lesh Geoffrey C.
Eastman Kodak Company
Gerlach Robert A.
Nguyen Nam X.
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