Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-04-25
2006-04-25
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S325000, C528S287000, C528S398000
Reexamination Certificate
active
07033732
ABSTRACT:
Disclosed are an organic anti-reflective coating polymer having a structure represented by the following formula I which is introduced to the top portion of photoresist, its preparation method and an anti-reflective coating composition, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF or 157 nm VUV light source. More particularly, the present invention provides an organic anti-reflective coating polymer capable of protecting a photoresist from amine to improve the stability of a post exposure delay and to minimize pattern distortion caused by a swing phenomenon during a patterning process, its preparation method and an anti-reflective coating composition comprising the same. [formula I]wherein each of m and n is an integer ranging from 5 to 5,000.
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patent: 6057080 (2000-05-01), Brunsvold et al.
patent: 6274295 (2001-08-01), Dammel et al.
patent: 2003/0219682 (2003-11-01), Wakiya et al.
Chemical Abstract DN 122:272360.
Ashton Rosemary
Hynix / Semiconductor Inc.
Marshall & Gerstein & Borun LLP
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