Method of preparing a photo-mask for imaging three-dimensional o

Details Method of preparing a photo-mask for imaging three-dimensional o Method of preparing a photo-mask for imaging three-dimensional o

1990-09-10

1992-08-25

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430315, 430313, 427 96, 427 99, G03F 900

Patent

active

051418290

ABSTRACT:
A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is posiitoned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by photo-imaging and then depositing a track material on a film that conformed to the surfaces of the three-dimensional substrate. An adhesive layer applied over the film cements a membrane material poured upon the adhesive layer. Once the membrane material sets into the membrane it is sepaarated from the substrate to form the photo-mask of the present invention.

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patent: 4985116 (1991-01-01), Mettler et al.
patent: 5039735 (1991-08-01), Aria et al.

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