Method of preparing a pattern on a silicon wafer

Details Method of preparing a pattern on a silicon wafer Method of preparing a pattern on a silicon wafer

1975-03-06

1976-06-22

Brammer, Jack P.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 351, 96115R, 20415914, 260 63R, 260 63UY, G03C 500, G03C 168

Patent

active

039649091

ABSTRACT:
Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.

REFERENCES:
patent: 3331819 (1967-06-01), Spainhour
patent: 3406149 (1968-10-01), Vogel
patent: 3471291 (1969-10-01), Schaefer
patent: 3650743 (1972-03-01), Hallman et al.
patent: 3790377 (1974-02-01), Smets et al.
patent: 3884969 (1975-05-01), Bowden et al.
patent: 3893127 (1975-07-01), Kaplan et al.

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