Method of polishing glass articles in an acid bath

Details Method of polishing glass articles in an acid bath Method of polishing glass articles in an acid bath

1983-09-29

1985-11-26

Caroff, Marc L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

252 793, 252 794, C03C 1502

Patent

active

045553041

ABSTRACT:
The method according to the invention of polishing glass in a polishing bath containing sulfuric acid and hydrofluoric acid permits long polishing times and thus reduced alternating treatments in polishing bath and washing bath at high polishing speed due to the fact that the polishing bath contains at least one acid which is stronger than the hydrofluoric acid, in particular acids whose dissociation constants are higher than that of the second dissociation stage of the sulfuric acid; preferably, oxalic acid is used. In order that the sulfuric acid concentration can be increased--in particular for glasses containing alkaline earth--0.1 to 5 g sodium chloride and/or potassium chloride per liter of polishing bath are added to the polishing bath during an 8-hour shift, either all at once or in portions.

REFERENCES:
patent: 1777321 (1930-10-01), Meth
patent: 2328533 (1943-08-01), Walker
patent: 3290193 (1966-12-01), Salzle
patent: 3546037 (1970-12-01), Salzle
patent: 4040897 (1977-08-01), Blish et al.
patent: 4332649 (1982-06-01), Salzle
patent: 4395304 (1983-07-01), Kern et al.

Affiliated with

Also associated with

Rating

Method of polishing glass articles in an acid bath does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of polishing glass articles in an acid bath, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of polishing glass articles in an acid bath will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-268509