Method of plasma etching of films containing chromium

Details Method of plasma etching of films containing chromium Method of plasma etching of films containing chromium

1983-06-20

1984-05-01

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 1566591, 204192E, 252 791, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

044459661

ABSTRACT:
A method of etching a thin film containing chromium using fluorine or a fluorine containing compound without leaving an electrically conductive residue is described.

REFERENCES:
patent: 3951709 (1976-04-01), Jacob
patent: 4115184 (1978-09-01), Poulsen
patent: 4160691 (1979-07-01), Abolafia
patent: 4229247 (1980-10-01), Chiu et al.

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