Method of planarizing a film of a semiconductor device

Details Method of planarizing a film of a semiconductor device Method of planarizing a film of a semiconductor device

1996-06-19

1998-09-08

Chapman, Mark

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

216 2, 216 38, B44C 122

Patent

active

058045147

ABSTRACT:
The present invention relates to a method of planarizing a film of a semiconductor device, which can improve the yield of the device by improving the planarizing in a way that coats a photoresist on an insulating film having a high topology, entirely exposes it using low energy, maintains the photoresist at the valley portion of the insulating film during the development process and then etches the opened insulating film using the remaining photoresist as an etching barrier.

REFERENCES:
patent: 4523975 (1985-06-01), Groves et al.
patent: 4952274 (1990-08-01), Abraham

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