Method of photolithographically metallizing at least the inside

Details Method of photolithographically metallizing at least the inside Method of photolithographically metallizing at least the inside

1995-12-04

1998-04-28

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430318, 430329, G03F 700

Patent

active

057442835

ABSTRACT:
Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material.
A method of metallizing an electrically insulating plate, for example, of glass, having a large number of holes. Said holes are internally provided with a metal layer and the plate is provided with metal tracks. The metal used is mainly aluminium. The aluminium is coated with a thin protective layer of chromium, cobalt, nickel, zirconium or titanium. Said protective layer makes it possible to use a photosensitive, electrophoretic lacquer for providing the metal layer with a structure. The method can very suitably be used for the manufacture of selection plates for thin electron displays.

REFERENCES:
patent: 4008084 (1977-02-01), Ikeda
patent: 4673458 (1987-06-01), Ishikawa
patent: 5415749 (1995-05-01), Hamilton

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