Method of photolithographically metallizing at least the inside

Details Method of photolithographically metallizing at least the inside Method of photolithographically metallizing at least the inside

1998-02-02

2000-04-04

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430319, G03F 726

Patent

active

060459794

ABSTRACT:
A description is given of a method of metallizing an electrically insulating plate, for example, of glass having a large number of holes. Said holes are internally provided with a metal layer and the plate is provided with metal tracks. The metal used is mainly aluminum. The aluminum is coated with a thin protective layer of chromium, cobalt, nickel, zirconium or titanium. Said protective layer makes it possible to use a photosensitve, cataphoretic lacquer for providing the metal layer with a structure. The method can very suitably be used for the manufacture of selection plates for thin electron displays.

REFERENCES:
patent: 5824454 (1998-10-01), Spierings

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