Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2006-10-03
2006-10-03
Perkey, W. B. (Department: 2851)
Optics: measuring and testing
Lens or reflective image former testing
C355S077000, C430S030000
Reexamination Certificate
active
07116411
ABSTRACT:
A method of optimizing a process for use with a plurality of lithography systems. The method includes the steps of: (a) determining a calibrated resist model for a given process and a target pattern utilizing a first lithography system; (b) selecting a second lithography system to be utilized to image the target pattern utilizing the given process, the second lithography system capable of being configured with one of a plurality of diffractive optical elements, each of the plurality of diffractive optical elements having corresponding variable parameters for optimizing performance of the given diffractive optical element; (c) selecting one of the plurality of diffractive optical elements and simulating the imaging performance of the second lithography system utilizing the selected one of the plurality of diffractive optical elements, the calibrated resist model and the target pattern; and (d) optimizing the imaging performance of the selected one of the plurality of diffractive optical elements by executing a genetic algorithm which identifies the values of the parameters of the selected one of the plurality of diffractive optical elements that optimizes the imaging of the target pattern.
REFERENCES:
patent: 6678240 (2004-01-01), Geh et al.
patent: 6781682 (2004-08-01), Kasai et al.
Chen Jang Fung
Liebchen Armin
Park Sang-bong
ASML Masktools B.V.
McDermott Will & Emery LLP
Nelson Vivian
Perkey W. B.
LandOfFree
Method of performing resist process calibration/optimization... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of performing resist process calibration/optimization..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of performing resist process calibration/optimization... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3655713