Method of patterning an inorganic overcoat for a liquid crystal

Details Method of patterning an inorganic overcoat for a liquid crystal Method of patterning an inorganic overcoat for a liquid crystal

1995-02-21

1996-03-26

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430317, 430323, 430 20, 359 36, B44C 122

Patent

active

055019439

ABSTRACT:
A method of photodefining a hardcoat material to cover electrodes on a substrate. The substrate and the circuit pattern are coated (10) with a thin film of a tetramethoxy silane or tetraisopropoxy titanate hardcoat material. A positive photoresist is applied (30) over the thin film of hardcoat material and selectively exposed to actinic radiation(40). The photoresist is developed (50) to expose portions of the underlying hardcoat film, and the hardcoat film is etched (50) with an alkaline etchant solution to form a pattern. The etching and developing take place in the same step. The photoresist is then removed (60), and the patterned hardcoat material is baked (70).

REFERENCES:
patent: 3928658 (1975-12-01), van Bostel, et al.
patent: 4023259 (1977-05-01), Kubota et al.
patent: 4865649 (1989-09-01), Kashiwagi
patent: 5186787 (1993-02-01), Phillips

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