Method of patterning a semiconductor device

Details Method of patterning a semiconductor device Method of patterning a semiconductor device

1999-12-23

2000-12-05

Smith, Matthew

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

438 30, 438149, 349 80, 359 80, H01L 21469

Patent

active

061566691

ABSTRACT:
A method for forming semiconductor devices involves nebulizing a liquid suspension of particles to form tiny droplets of particles and liquid which are well separated from one another. The nebulized droplets may correspond roughly to the average particle size which may be, for example, about one to two microns. The particles in droplet form then form a vaporous dispersion which can be dried to remove the liquid. The particles may be biased so as to repel one another to further form a well defined separation between adjacent particles. The particles may then be collected on a substrate so that a random distribution of masking particles are formed. The randomly distributed particles may be used as a mask for defining features in a semiconductor structure. The mask may be utilized, for example, to define emitters in a field emission display or spacers in a liquid crystal display.

REFERENCES:
patent: 5078475 (1992-01-01), Sekimura et al.
patent: 5130831 (1992-07-01), Kohara et al.
patent: 5328728 (1994-07-01), Swirbel et al.
patent: 5552913 (1996-09-01), Shimizu et al.
patent: 5615031 (1997-03-01), Saiuchi et al.
patent: 5764320 (1998-06-01), Konuma et al.
patent: 5815231 (1998-09-01), Nishi et al.
patent: 5963283 (1999-10-01), Omae et al.
patent: 5995191 (1999-11-01), Tamai et al.

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