Method of patterning a resist layer for manufacture of a semicon

Details Method of patterning a resist layer for manufacture of a semicon Method of patterning a resist layer for manufacture of a semicon

1978-12-18

1981-05-19

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430296, B05D 306

Patent

active

042686075

ABSTRACT:
A method of patterning a radiation-sensitive resist layer for manufacture of a semiconductor element which uses a radiation-sensitive resist layer formed of at least one of the radiation sensitive materials whose compositions are expressed by any of the following general structural formulas: ##STR1## wherein: R.sub.1 =methyl group, halogenated methyl group, cyano group or halogen element

REFERENCES:
patent: 4011351 (1977-03-01), Gipstein et al.
patent: 4061829 (1977-12-01), Taylor
patent: 4096290 (1978-06-01), Fredericks
patent: 4125672 (1978-11-01), Kakuchi et al.
Roberts "Applied Polymer Symposium" No. 23, pp. 87-98 (1974). _

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