Method of patterning a layer using a pellicle

Details Method of patterning a layer using a pellicle Method of patterning a layer using a pellicle

2011-05-03

2011-05-03

Booth, Richard A. (Department: 2812)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S016000, C430S005000

Reexamination Certificate

active

07935547

ABSTRACT:
A method for patterning a layer on a semiconductor substrate includes forming a layer of a semiconductor substrate and exposing the layer to light. The light travels through a second pellicle that is manufactured by a method that includes determining a first transmission of a first light through a first pellicle, wherein the first light is normal to the first pellicle, determining a second transmission of a second light through the first pellicle, wherein the second light is not normal to the first pellicle, and modifying the first pellicle to form a second pellicle using the first and second transmission.

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