Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2004-06-01
2009-08-25
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S695000, C438S745000, C257SE23133, C257SE21017
Reexamination Certificate
active
07579280
ABSTRACT:
A method of patterning a thin film. The method includes forming a mask on a film to be patterned. The film is then etched in alignment with the mask to form a patterned film having a pair of laterally opposite sidewalls. A protective layer is formed on the pair of laterally opposite sidewalls. Next, the mask is removed from above the patterned film. After removing the mask from the patterned film, the protective layer is removed from the sidewalls.
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Brask Justin K.
Chau Robert S.
Doyle Brian S.
Shah Uday
Blakely , Sokoloff, Taylor & Zafman LLP
Estrada Michelle
Intel Corporation
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