Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2005-08-05
2008-09-02
Norton, Nadine (Department: 1792)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S027000, C216S066000, C360S322000, C360S319000, C360S324200
Reexamination Certificate
active
07419610
ABSTRACT:
A method for fabricating a read head sensor for a magnetic disk drive is presented. The method includes providing a layered wafer stack to be shaped, where the layered wafer stack includes a free layer, a barrier layer and a pinned layer. A single- or multi-layered photoresist mask is formed upon the layered wafer stack to be shaped. A material removal source is provided and used to perform a partial depth material removal within a partial depth material removal range which extends from the free layer to within the pinned layer to a partial depth material removal endpoint. In various embodiments, this depth endpoint lies at or within the barrier layer or within but not through the pinned layer.
REFERENCES:
patent: 5650958 (1997-07-01), Gallagher et al.
patent: 6198608 (2001-03-01), Hong et al.
patent: 6322640 (2001-11-01), Xiao et al.
patent: 6330136 (2001-12-01), Wang et al.
patent: 6479353 (2002-11-01), Bhattacharyya
patent: 6631055 (2003-10-01), Childress et al.
patent: 6700759 (2004-03-01), Knapp et al.
patent: 6754056 (2004-06-01), Ho et al.
patent: 6833979 (2004-12-01), Knapp et al.
patent: 6989971 (2006-01-01), Lin et al.
patent: 2002/0093773 (2002-07-01), Pinarbasi
patent: 2002/0097537 (2002-07-01), Shimazawa
patent: 2003/0086216 (2003-05-01), Kagami et al.
patent: 2003/0231436 (2003-12-01), Nishiyama
patent: 2003/0231437 (2003-12-01), Childress et al.
patent: 2004/0047085 (2004-03-01), Liao et al.
patent: 2004/0052005 (2004-03-01), Zolla et al.
patent: 2004/0190205 (2004-09-01), Miyauchi
patent: 2004179250 (2004-06-01), None
Yoshiyuki Fukumoto et al.; Effect of Milling Depth of the Junction Pattern on Magnetic Properties and Yields in Magnetic Tunnel Junctions; Jpn. J. Appl. Phys. vol. 41 (2002).
T Niizeki et al.; Nanofabrication of magnetic tunnel junctions by using side-edge thin film deposition; Science and Technology of Advanced Materials (2003).
Cyrille Marie-Claire
Hong Ying
Jayasekara Wipul Pemsiri
Angadi Maki
Guernsey Larry B.
Hitachi Global Storage Technologies - Netherlands B.V.
Norton Nadine
Patent Law Office of Larry Guernsey
LandOfFree
Method of partial depth material removal for fabrication of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of partial depth material removal for fabrication of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of partial depth material removal for fabrication of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3986979