Method of oxidizing member to be treated

Details Method of oxidizing member to be treated Method of oxidizing member to be treated

2007-12-04

2007-12-04

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S770000, C438S774000, C438S762000, C438S765000, C438S769000, C257SE21285, C257SE21283, C257SE21282

Reexamination Certificate

active

10519451

ABSTRACT:
A method for oxidation of an object to be processed is provided wherein an oxide film can provide favorable film quality and a laminate structure of nitride film and oxide film can be obtained by a thermal oxidation of a nitride film.In a method for oxidation of a surface of an object to be processed in a single processing container8which can contain a plurality of objects to be processed, at least a nitride film is exposed on said surface, and said oxidation is performed by mainly using active hydroxyl/oxygen species in a vacuum atmosphere, setting a processing pressure to 133 Pa or below, and setting a processing temperature to 400° C. or above. Under these conditions, high interplanar uniformity is maintained and oxide films with favorable film quality are obtained by oxidizing nitride films on the surfaces of a plurality of objects to be processed.

REFERENCES:
patent: 6114258 (2000-09-01), Miner et al.
patent: 2002/0014700 (2002-02-01), Tokai et al.
patent: 2002/0127873 (2002-09-01), Sato et al.
patent: 1 152 461 (2001-07-01), None
patent: 1 152 461 (2001-11-01), None
patent: 1152461 (2001-11-01), None
patent: 03-140453 (1991-06-01), None
patent: 57-001232 (1992-01-01), None
patent: 2001-274154 (2001-10-01), None
patent: 2002-176052 (2002-06-01), None
patent: 2002528892 (2002-09-01), None
patent: 2002-353214 (2002-12-01), None
patent: WO 00/24049 (2000-04-01), None

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