Method of oxide etching with condensed plasma reaction product

Details Method of oxide etching with condensed plasma reaction product Method of oxide etching with condensed plasma reaction product

1989-12-27

1991-07-09

Fisher, Richard V.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156646, 134 1, 134 31, H01L 21306

Patent

active

050303198

ABSTRACT:
Oxide material, on a substrate, in a reactor, is etched by dissolving a hydrogen halide reaction product in a liquid phase reaction product. Both the hydrogen halide and liquid phase reaction products are produced through a chemical reaction of a reactive gas containing hydrogen and halogen elements as well as at least one gaseous compound which has been remotely activated. The liquid phase reaction product is obtained by condensation on the oxide material. The use of charged particle beams and irradiating light is discussed.

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