Method of optimizing focus of optical inspection apparatus...

Optics: measuring and testing – Inspection of flaws or impurities – Surface condition

Reexamination Certificate

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C356S237500, C250S559450, C382S149000

Reexamination Certificate

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07084969

ABSTRACT:
According to a method of optimizing a focus of an optical inspection apparatus, a first light is irradiated onto a substrate. Then, the first light is reflected on the substrate to form a second light. The second light is sensed with various foci to form image information corresponding to each of the foci. Then, a relation between foci of the optical inspection apparatus and gain value corresponding to the image information is obtained. Then, the focus corresponding to a minimum gain value is set up as an optimized focus. Thus, a focus of an optical inspection apparatus is accurately adjusted to enhance efficiency of defecting defects, so that defects of semiconductor apparatus are more accurately detected.

REFERENCES:
patent: 6298019 (2001-10-01), Watanabe et al.
patent: 6338926 (2002-01-01), Ku et al.
patent: 6696679 (2004-02-01), Graef et al.
patent: 2004/0141640 (2004-07-01), Lee et al.
patent: 2004/0150813 (2004-08-01), Kim et al.
patent: 6-281409 (1994-10-01), None
patent: 1999-023205 (1999-03-01), None
patent: 1999-0072263 (1999-09-01), None
English language abstract of Japanese Publication No. 6-281409.
English language abstract of Korean Publication No. 1999-0072263.
English language abstract of Korean Publication No. 1999-023205.

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