Method of optical lithography with super resolution and projecti

Details Method of optical lithography with super resolution and projecti Method of optical lithography with super resolution and projecti

1993-02-03

1995-07-25

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

2504921, 355 53, 355 71, G03C 500

Patent

active

054361141

ABSTRACT:
It is possible to improve the resolution of a formed pattern by utilizing anti-dissolution surface treatment of a photoresist layer and super resolution of an optical system, thereby to print a finer pattern having a narrower width than that of the resolving power determined by the wavelength of light used and the numerical aperture of a projection optical system, and patterning in the order of submicron is made possible easily when applied to a printing technique in a manufacturing process of semiconductor integrated circuits.

REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli
patent: 4988188 (1991-01-01), Ohta
patent: 5144362 (1992-09-01), Kamon
patent: 5302999 (1994-04-01), Oshida
patent: 5316896 (1994-05-01), Fukuda
patent: 5323208 (1994-06-01), Fukuda
Nikkei Microdevice for Feb. 1987, pp. 103-124, Drawings only.
Hitachi Technical Review vol. 71, No. 5 (May 1989) pp. 25-32, Drawings only.

Affiliated with

Also associated with

Rating

Method of optical lithography with super resolution and projecti does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of optical lithography with super resolution and projecti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of optical lithography with super resolution and projecti will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-738924