Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2006-11-03
2010-10-26
Kebede, Brook (Department: 2894)
Semiconductor device manufacturing: process
With measuring or testing
C438S017000
Reexamination Certificate
active
07820457
ABSTRACT:
A method includes measuring a gate leakage current of a plurality of transistors. A single stress bias voltage is applied to the plurality of transistors. The stress bias voltage causes a 10% degradation in a drive current of each transistor within a respective stress period t. One or more relationships are determined, between the measured gate leakage current and one or more of the group consisting of gate voltage, gate length, gate temperature, and gate width of the plurality of transistors, respectively. A negative bias temperature instability (NBTI) lifetime τ of the plurality of transistors is estimated, based on the measured gate leakage current and the one or more relationships.
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Chen Chia-Lin
Chen Ming-Chen
Lin Yi-Miaw
Duane Morris LLP
Kebede Brook
Koffs Steven E.
Taiwan Semiconductor Manufacturing Co. Ltd.
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