Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-05-04
1993-12-14
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429809, 20429812, C23C 1434
Patent
active
052698947
ABSTRACT:
A method of mounting a vacuum process arrangement comprises providing a cooling plate having at least one channel and at least one bayonet locking means. A heat conducting membrane is then placed over each channel of the cooling plate. A target plate having at least one bayonet locking means is also provided. The locking plate is then locked to the cooling plate over the channels by engaging the bayonet locking means of the target plate with the bayonet locking means of the cooling plate by limited relative axial and rotational movement between the plates. Finally, a cooling medium is introduced in the channels of the cooling plate and pressurized.
REFERENCES:
patent: 5032246 (1991-07-01), Blazic et al.
patent: 5071535 (1991-12-01), Hartig et al.
Balzers Aktiengesellschaft
Nguyen Nam
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